ELK Stress
| Property | Value |
|---|---|
| Identifier: | org.eclipse.elk.stress |
| Meta Data Provider: | options.StressMetaDataProvider |
Description
Minimizes the stress within a layout using stress majorization. Stress exists if the euclidean distance between a pair of nodes doesn’t match their graph theoretic distance, that is, the shortest path between the two nodes. The method allows to specify individual edge lengths.
Category: Force
Layout algorithms that follow physical analogies by simulating a system of attractive and repulsive forces. The first successful method of this kind was proposed by Eades in 1984.
Supported Options
| Option | Default Value |
|---|---|
| Desired Edge Length | 100.0 |
| Fixed Position | false |
| Inline Edge Labels | true |
| Interactive | false |
| Iteration Limit | Integer.MAX_VALUE |
| Layout Dimension | Dimension.XY |
| Node Label Placement | NodeLabelPlacement.fixed() |
| Node Size Constraints | EnumSet.noneOf(SizeConstraint) |
| Node Size Minimum | new KVector(0, 0) |
| Node Size Options | EnumSet.of(SizeOptions.DEFAULT_MINIMUM_SIZE) |
| Omit Node Micro Layout | false |
| Port Label Placement | PortLabelPlacement.outside() |
| Stress Epsilon | 10e-4 |
